P. Moens, et al. have proposed that CVS-TDDB cannot capture the impact of both electron and hole trapping mechanisms on the failure distribution function, in contrast to CCS-QBD. In this work, the investigation of electron trapping under the CCS is conducted in commercial Silicon dioxides thermally grown on 4H-SiC based on the electron trapping model proposed by M. Liang, et al. The model results are consistent with the measured results when the electron trapping dominants.