Lecture image placeholder

Premium content

Access to this content requires a subscription. You must be a premium user to view this content.

Monthly subscription - $9.99Pay per view - $4.99Access through your institutionLogin with Underline account
Need help?
Contact us
Lecture placeholder background
VIDEO DOI: https://doi.org/10.48448/0z30-jg60

technical paper

EIPBN 2021

June 02, 2021

United States

Fabrication of Ultra-Thin Suspended ALD Membranes

Please log in to leave a comment

Downloads

SlidesTranscript English (automatic)

Next from EIPBN 2021

Plasma Etching of High Aspect ratio Sapphire Antireflection Nanostructures Using Multilayer Etching Mask
poster

Plasma Etching of High Aspect ratio Sapphire Antireflection Nanostructures Using Multilayer Etching Mask

EIPBN 2021

I-Te ChenYi-An Chen
Chih-Hao Chang and 2 other authors

01 June 2021

Similar lecture

Focused Ion Beam Patterning for Defect-Mediated Nucleation on 2D van der Waals Materials
technical paper

Focused Ion Beam Patterning for Defect-Mediated Nucleation on 2D van der Waals Materials

EIPBN 2021

Vera Zarubin
Vera Zarubin

02 June 2021

Stay up to date with the latest Underline news!

PRESENTATIONS

  • All Lectures
  • For Librarians
  • Resource Center
  • Free Trial
Underline Science, Inc.
1216 Broadway, 2nd Floor, New York, NY 10001, USA

© 2023 Underline - All rights reserved