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Maskless Grayscale lithography is a key technology to create structured surfaces in photoresist, especially for micro-optic applications. Processes of low-contrast positive resist are well known and used for thicknesses up to 60 µm. The possibility to fabricate higher structures, i.e. 80 µm, 100 µm high and beyond, are of great interest in the micro-optic world. With some double- and triple-coated layers of an experimental resist, we could make structures 83µm and 100µm tall. The triple- coated layer showed some limitations that we plan to overcome to go beyond 100µm.

EIPBN 2021

Improvements on Maskless Grayscale Lithography in thick positive photoresist

The 15th Joint MMM-INTERMAG Conference (2022 Joint) is sponsored jointly by AIP Publishing and the IEEE Magnetics Society. Members of the international scientific and engineering communities interested in recent developments in fundamental and applied magnetism are invited to attend and contribute to the technical sessions. The technical program will include invited and contributed papers in oral and poster sessions, invited symposia, a plenary session, and an evening session, with about 1500 presentations overall. This Conference provides an outstanding opportunity for worldwide participants to meet their colleagues and collaborators and discuss developments in all areas of magnetism research.

The 2022 Joint Conference will offer both in-person and prerecorded on-demand content.

For tickets to the event, please register at the following link: https://magnetism.org/register

Please register for the Joint MMM-Intermag conference to join the event.

2022 Joint MMM-INTERMAG

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The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as "3-Beams," is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. In its 64th meeting, researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.
 
 
 
[![](https://assets.underline.io/uploads/markdown_image/1/image/4bdf4450aa93073cd684b096b403df2e.png)](https://drive.google.com/file/d/1CPaA3-Yf7_maBxJMUJaUORLF3HGO9CIe/view?usp=sharing) [![](https://assets.underline.io/uploads/markdown_image/1/image/cea8a407085dee5422a2c16738ce27ca.png)](https://eipbn.org/abstracts/2021/)

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We present the fabrication of ion sliced lithium niobate on oxidized silicon for integrated optics. Using structural modeling to optimize wafer thicknesses and a bonding apparatus to match wafer bows, an 817 nm thick lithium niobate film on oxidized silicon is achieved over a centimeter scale area.

Stress reduction and wafer bow accommodation for the fabrication of thin film lithium niobate on oxidized silicon

We will discuss our use of ZnO nanoparticle-based thin films synthesized and grown at room temperature and deposited via electrophoretic deposition (EPD) onto p-doped silicon substrates.  Our experimentation plan includes using scanning electron microscopy to assess surface morphology and current-voltage characterization of ZnO/p-Si heterojunctions to study device performance potential.

Study of Electrophoretic Deposition of ZnO Nanoparticles onto Silicon Substrates and Testing Performance of ZnO/p-Si

We present results clearly demonstrating passive gradient-driven droplet motion on coating-free all-metal Al-surfaces, produced via laser-etching method.

Development of Coating-free Super Water-repellent Micropatterned Aluminium for Spontaneous Droplet Motion

Applications of electrospinning (ES) fabrication are broad and limited by hardware. Here, we present an ES system that contains multiple high voltage power supplies and enables high control over nanofiber placement, resulting in deposition of materials that have novel structures on the mesoscale.

Highly Controlled Deposition with Multiple Electrode Electrospinning

Our goal is to demonstrate a process flow for TSV (nozzle) on one end and another opening (reservoir) on the other end of an SOI. This silicon die will be used as a micro chemical vapor deposition (CVD) chamber, which is a critical component in the nanoscale additive writing process.

Fabrication of Micro Chemical Vapor Deposition Chamber by Dry dry Deep Silicon and Metal-Assisted Etching Techniques

We developed a versatile room-temperature metal printing technique based on polymer-assisted photochemical deposition (PPD). We demonstrate printing of metal structures with feature sizes as small as 5µm on various substrates, and prove the concept of creating metal-based color filter using PPD.

Additive Manufacturing towards Color Printing via Polymer-Assisted Photochemical Deposition of Metal Thin Films

The heavy metals are poisonous due to inability to decompose and bioaccumulation hence, among the cost well-known environmental pollutant.  Fluorescent based approach has gained considerable attention because of real time monitoring. Aiming at developing an ideal fluorescent sensing platform for heavy metals we synthesized bimetallic MOF for the first time.

Fabrication of luminescent metal-organic framework for optical detection of heavy metals

Here we demonstrate a new type of magnetically responsive nanostructure consisting of a polydimethylsiloxane (PDMS) nanopillar array with deposited nickel caps, that has successfully achieved such decoupling with multiple cap-geometry designs for a better actuation control.

Magnetically Responsive Polymer Nanopillars with Nickel Cap

we have proposed a hybrid machine learning system that presents the optimum materials and process conditions for direct nanoimprint.　The system applied for optimization of Glycol concentration to PVA for low temperature process and the results agree with experiments.

Process and material design using hybrid machine learning for direct thermal nanoimprint

New resists are required to advance the nanoelectronics industry to keep up the demands of Moore’s law. A new class of high dry etch selectively electron beam resist materials have been developed that are based on a family of heterometallic rings.

Improvements on Maskless Grayscale Lithography in thick positive photoresist

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Stress reduction and wafer bow accommodation for the fabrication of thin film lithium niobate on oxidized silicon

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