Lecture image placeholder

Premium content

Access to this content requires a subscription. You must be a premium user to view this content.

Monthly subscription - $9.99Pay per view - $4.99Access through your institutionLogin with Underline account
Need help?
Contact us
Lecture placeholder background
VIDEO DOI: https://doi.org/10.48448/xzfa-5x83

poster

EIPBN 2021

June 01, 2021

United States

Stress reduction and wafer bow accommodation for the fabrication of thin film lithium niobate on oxidized silicon

Please log in to leave a comment

Downloads

Transcript English (automatic)

Next from EIPBN 2021

Optimization of the Built-in Lens Mask for Three-Dimensional Photo Lithography
poster

Optimization of the Built-in Lens Mask for Three-Dimensional Photo Lithography

EIPBN 2021

+1Tomoaki OsumiYoshihiko Hirai
Yoshihiko Hirai and 3 other authors

01 June 2021

Similar lecture

Stay up to date with the latest Underline news!

PRESENTATIONS

  • All Lectures
  • For Librarians
  • Resource Center
  • Free Trial
Underline Science, Inc.
1216 Broadway, 2nd Floor, New York, NY 10001, USA

© 2023 Underline - All rights reserved