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Multiple bit upsets (MBUs) are observed in shift register circuits at the 5-nm bulk FinFET node for alpha particles and heavy ions.

IRPS 2024 Main Conference

Multiple Bit Upsets in Register Circuits at the 5-nm bulk FinFET node

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#### Welcome to the 62nd IEEE International Reliability Physics Symposium (IRPS)! 
**The 2024 IEEE International Reliability Physics Symposium (IRPS) will be held in Dallas, Texas from April 14 to 18, 2024. It will be presented as an in-person conference, with a virtual component available.** 

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**[IRPS 2024 eGuide](https://drive.google.com/file/d/1DHxkWbafodK_D2HlDi7lwRK7KatgBgBD/view?usp=drive_link)**

Please save the zip file locally and click the "start.pdf" to view the file. 
 
**IRPS 2024 General Chair Welcome Message**

On behalf of the Management Committee of the IEEE International Reliability Physics Symposium (IRPS) and the IRPS Board of Directors, it gives me great pleasure to extend a warm welcome to all who are planning to attend the IRPS 2024, scheduled to take place from April 14-18, 2024, in Dallas, TX. 
Over its 62-year history, IRPS has solidified its position as the premiere conference for engineers and scientists to present new and original work in the field of microelectronics reliability. Drawing participants from the United States, Europe, Asia, and other parts of the world, IRPS aims to deepen our understanding of reliability of semiconductor devices, integrated circuits, and microelectronic assemblies through an improved understanding of both the physics of failure as well as the application environment. IRPS offers diverse opportunities for attendees to enhance their knowledge and understanding of all aspects of microelectronics reliability. It is also an outstanding chance to meet and network with reliability colleagues from around the world.

The IRPS 2024 technical activities will begin with two days of a total of twenty tutorial sessions covering a broad spectrum of emerging reliability topics beyond CMOS device, circuit and system reliability. These sessions are devoted to both newcomers as well as experts. Three reliability Year in Review (YIR) talks focusing on neuromorphic computing, dielectric breakdown in leading edge devices, and GaN technology will be provided on Monday after the tutorials.

The IRPS 2024 technical program will feature four distinguished keynote talks in the plenary sessions delivered by Prof. Shinichi Takagi from The University of Tokyo and Dr. Su Jin Ahn from Samsung on Tuesday, Dr. Rajeev Malik from IBM on Wednesday, and Dr. Sameer Pendharkar from Texas Instruments on Thursday. The technical program, organized into three parallel tracks, consists of contributed and seventeen invited papers from leaders in industry and academia. Additionally, two invited talks by recipients of paper awards from our sister conferences, European Symposium on Reliability of Electron Device Failure Physics and Analysis (ESREF) 2023 and the International Integrated Reliability Workshop (IIRW) 2023, will be given in the technical program. 

Tuesday evening will host ten workshops, offering an opportunity for in-depth, face-to-face discussions on emerging reliability challenges, including the three IRPS 2024 focus topics. A poster session will be held in the Austin Ranch outside the symposium building on Wednesday evening. Both events are sure to be lively. The IRPS 2024 and the International ESD Workshop (IEW) will be co-hosted with IEW registrants participating in both IRPS and IEW programs.

The IRPS 2024 will adopt a hybrid conference style, allowing virtual access to live oral presentations hosted by the Underline. Real-time streaming of all technical events (excluding Workshops and Posters) will be available in the US Central Timezone, providing virtual attendees with Q&A opportunities. For those virtual attendees who cannot watch the live presentations, the material will be available on demand to all attendees after the symposium. All authors will be presenting in person.

Finally, I would like to extend my extreme gratitude to our patrons, exhibitors, and all participants for their invaluable support, which makes IRPS successful. 

Please enjoy the IRPS 2024!

Koji Eriguchi, General Chair 
of 2024 IRPS Management Committee
 
**About IRPS** 
The IEEE International Reliability Physics Symposium (IRPS) is the premiere conference for engineers and scientists to present new and original work in the area of microelectronics reliability. Drawing participants from the United States, Europe, Asia, and all parts of the world, IRPS seeks to understand the reliability of semiconductor devices, integrated circuits, and microelectronic assemblies through an improved understanding of both the physics of failure as well as the application environment. IRPS provides numerous opportunities for attendees to increase their knowledge and understanding of all aspects of microelectronics reliability, and to meet and network with reliability colleagues from around the world.

To access the site please register [**here**](https://www.irps.org/registration-fees). 

The IEEE International Reliability Physics Symposium (IRPS) is the premiere conference for engineers and scientists to present new and original work in the area of microelectronics reliability. IRPS seeks to understand the reliability of semiconductor devices, integrated circuits, and microelectronic assemblies through an improved understanding of both the physics of failure as well as the application environment. 

This paper introduces an essential on-chip architecture to characterize Random Telegraph Noise (RTN) accurately for modern integrated circuits (ICs), demonstrated through results from test structures in SkyWater Technology's 90 nm CMOS process. A comprehensive multi-step process, including a pre-processing scan of a 96x128 device array, offers insights into device variability and RTN, guiding more efficient CMOS design strategies.

On-Chip Characterization of Random Telegraph Signal Noise in Bulk 90 nm CMOS

It is very important to predict cell oxide wear out life. The lifetime is determined by the degradation of the cell oxide due to the stress. It is necessary to identify the stress that the cell receives and accurately reproduce it in the evaluation. In this paper, the stress situation that cell oxide receives was analyzed through energy band and electric field strength of oxide, and an accurate prediction methodology for oxide lifetime was studied.

A valid experimental design of the lifetime prediction for NAND Cell Oxide

The mixed-mode reliability of Silicon Germanium HBTs is investigated down to 25K. Results suggest that damage (monitored by base current leakage) increases to a peak around 100K and then decreases. Results also show a not-before-reported shift in collector current from DC electrical stress, which is visible at cryogenic temperature and occurs regardless of the temperature the device is stressed at.

Anomalous Mixed-Mode Damage Effects in SiGe HBTs at Cryogenic Temperatures

In this paper, the impact of hot-carrier injection due to repetitive pulse switching of lateral DMOS transistors is studied. The proposed testing technique is used to emulate the dynamic switching conditions and the transistor reliability characteristics are compared with traditional DC measurement at constant gate/drain voltages. Experimental data shows that the repetitive pulse degradation under 6.6V drain stress is between two DC conditions (5.5V and 6.6V).

Repetitive Pulse Testing for LDMOS Transistor Reliability

The impact of scaling on the effects of mixed-mode electrical stress and ionizing radiation is assessed for third- and fourth-generation SiGe HBTs. When the devices were operating in forward-active mode, the fourth-generation technology showed a better radiation tolerance but worse hot carrier degradation due to mixed-mode stress. However, when the devices were operating in inverse-active mode, the trend was the opposite and the fourth-generation technology showed worse radiation tolerance but less mixed-mode degradation.

The Impact of Scaling on the Effects of Mixed-Mode Electrical Stress and Ionizing Radiation for 130-nm and 90-nm SiGe HBTs

We present a methodology to assess the damage on MOSFETs after non-conducting off-state induced hard breakdown. It's based on analyzing experimental S-parameters under common-source and common-drain configurations, which allows to identify the location of the damage by inspecting asymmetry in the electrical response. Furthermore, the technique is compatible with radiofrequency two-port test fixtures exhibiting one of the terminals grounded, such as those used for characterizing microwave devices. Using the technique, two breakdown mechanisms are observed.

Assessing Non-Conducting Off-State Induced Hard Breakdown for PD-SOI MOSFETs using an RF Measurement Technique

This paper introduces a novel three-dimensional approach to model threshold voltage variation (ΔVth) during TDDB stress of SiC trench MOSFETs in a wide temperature range T=273…523 K and studies the processes of ΔVth recovery at room temperature.

Threshold Voltage Drift and Recovery of SiC Trench MOSFETs during TDDB Stress

This study investigates hole-induced threshold voltage instability at high positive and negative gate stress in 4H-SiC power MOSFETs. Our study addresses the phenomenon of VT decrease by hole trapping that occurs during positive or negative high voltage gate screening, and the subsequent restoration of VT by applying a counterbalancing phenomenon such as electron-hole recombination or hole de-trapping to increase VT at positive gate bias. Therefore, threshold stability should be considered when applying gate screens.

Hole-induced threshold voltage instability under high positive and negative gate stress in SiC MOSFETs

P. Moens, et al. have proposed that CVS-TDDB cannot capture the impact of both electron and hole trapping mechanisms on the failure distribution function, in contrast to CCS-QBD. In this work, the investigation of electron trapping under the CCS is conducted in commercial Silicon dioxides thermally grown on 4H-SiC based on the electron trapping model proposed by M. Liang, et al. The model results are consistent with the measured results when the electron trapping dominants.

Investigation of the Electron Trapping in Commercial Thick Silicon Dioxides Thermally Grown on 4H-SiC Under the Constant Current Stress

The non-ideality in the subthreshold slope can be used to extract interface trap densities Ditvalues. We have applied this method to monitor changes in Dit under BTI stress and compare them to fixed oxide charges with regards to their impact on threshold voltage.

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Multiple Bit Upsets in Register Circuits at the 5-nm bulk FinFET node

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On-Chip Characterization of Random Telegraph Signal Noise in Bulk 90 nm CMOS

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