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In direct writing laser lithography, hybrid structures such as gratings on top of resist structures can be generated by combining thermal NIL with DWL lithography. At 120 °C, it is still possible to pattern the resist into at least 4 µm depth without degrading the photosensitive component.

EIPBN 2021

Hybrid structures achieved by direct writing laser lithography - tuning the contrast and surface topography of grayscale photoresist with nanoimprint lithography

direct write lithography

nanoimprint

hybrid structuring

grayscale lithography

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as "3-Beams," is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. In its 64th meeting, researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.
 
 
 
[![](https://assets.underline.io/uploads/markdown_image/1/image/4bdf4450aa93073cd684b096b403df2e.png)](https://drive.google.com/file/d/1CPaA3-Yf7_maBxJMUJaUORLF3HGO9CIe/view?usp=sharing) [![](https://assets.underline.io/uploads/markdown_image/1/image/cea8a407085dee5422a2c16738ce27ca.png)](https://eipbn.org/abstracts/2021/)

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technical paper

We demonstrate the co-deposition of B and P in aligned atomic-scale patterns, in order to make bipolar junction devices. This requires the use of BCl3 and PH3 as acceptor and donor dopant precursors, and dI/dV imaging to relocate the B electrode and align the P electrodes to it.

 Co-deposition of B and P for Ultraprecise Bipolar devices

Wafer-scale fabrication was used to create STEM-compatible operando graphene devices that can be characterized during operation. The e-beam can be used to further alter the device design. We employ use of secondary electron e-beam induced current (SEEBIC) imaging to visualize device conductivity and examine device failure modes in extreme conditions.

Toward atomic-scale e-beam fabrication: imaging and altering graphene-based devices

Nano fabrication technologies are subject of research in several fields. The development and commercialization of nano-inside products are still waiting for its break through. However, this paper will describe three examples of research workin fields of bioinspired computing, nano patterned surfaces for flexible substrates, and nano optics for spectroscopic measurement.

 How to implement “nano” in everyday life? Nano fabrication technologies in application oriented research and development

This work is about using near-field phase lithography and ALD process repeatedly to create non-uniform nanolattices with spatially varying geometry and material composition. The proposed approach is also employed to make an antireflection GRIN surface which successfully reduces the specular reflectance by more than 60%.

 Gradient-Index Nanolattices Using Multilayer Processing

We demonstrate for the first time that anisotropic hydrofluoric acid etch behavior beneath certain metal pads (Ti, Au, Pt, Cr) can be controlled to create ultra-sharp 3D silica pyramids due to an interface effect.

Fabrication of silica pyramids by enhanced lateral etching of hydrofluoric acid below metal films

Organic soft materials, such as gels are materials of choice for a vast number of biomedical applications such as tissue engineering, soft robotics, biosensing, drug delivery, implantable electronics, etc. Here we report on in-liquid direct write technique for 3D-sculpturing of hydrogels using focused electron and X-ray beams.

Electron and X-ray Beam Direct Write Lithography in Liquids: a Step Toward 3D Nanoprinting of Soft Materials

High aspect ratio nanostructuring requires high precision pattern transfer with highly directional etching. In this work, we demonstrate the fabrication of structures with unprecedented ultra-high aspect ratios up to 10’000:1 in the nanoscale regime (down to 10 nm) by metal assisted chemical etching (MacEtch) of silicon in gas phase.

Nanofabrication by Metal Assisted Chemical Etching of Silicon in Gas Phase

In this paper we report a series of breakthroughs that led to replication of gratings with a slant angle up to 60° and an aspect ratio of 10:1 in a material with refractive index of 1.90 (RI). A study of the replication process and materials optimization will be presented.

Nanoimprint process to mass manufacture highly-angled high-RI gratings for augmented reality combiners

Sequential vapor infiltration (SVI) with trimethylaluminum into UV-cured films visualized the presence of internal layered structures with different Al distributions dependent on chemical structure of monomers. X-ray reflectivity measurements revealed that the mixing of monomers was a positive way to homogenize the Al distributions in UV-cured films.

Internal Layered Structures of UV-Cured Thin Films after Sequential Vapor Infiltration Analyzed by X-ray Reflectivity Measurements

Until now, no in-situ, non-destructive and accurate technology has been invented, which introduces huge difficulties into the superhydrophobic surfaces research and applications. We developed an optical technology to characterize the state of superhydrophobic surface.

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Hybrid structures achieved by direct writing laser lithography - tuning the contrast and surface topography of grayscale photoresist with nanoimprint lithography

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Co-deposition of B and P for Ultraprecise Bipolar devices

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