United States

Until now, no in-situ, non-destructive and accurate technology has been invented, which introduces huge difficulties into the superhydrophobic surfaces research and applications. We developed an optical technology to characterize the state of superhydrophobic surface.

EIPBN 2021

Optical Metrology of Characterizing Superhydrophobic States on Patterned Substrates

characterizing superhydrophobic states

nanoimprint lithography

superhydrophobic surfaces

After two years of virtual conferences, we're excited to host EMC 2022 in person at The Ohio State University in Columbus, Ohio. In addition to cutting-edge technical presentations given in multiple parallel sessions, opportunities to network with colleagues will be present throughout the conference. The size and format of the meeting makes networking easy, whether you have been coming to the conference for many years or are a first-time attendee.

EMC is coordinated with the Device Research Conference (DRC), which will be held the same week, from June 26-29. This recognizes the strong interaction between device and electronic materials research and provides fruitful exchange of information between attendees of both Conferences.

For information on the 80th Device Research Conference, please visit the DRC 2022 website.



EMC 2022

The Electronic Materials Conference (EMC) is the premier annual forum on the preparation, characterization and use of electronic materials. This year’s event will feature a plenary session, topical sessions, a poster session and more.

technical paper

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as "3-Beams," is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. In its 64th meeting, researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.
 
 
 
[![](https://assets.underline.io/uploads/markdown_image/1/image/4bdf4450aa93073cd684b096b403df2e.png)](https://drive.google.com/file/d/1CPaA3-Yf7_maBxJMUJaUORLF3HGO9CIe/view?usp=sharing) [![](https://assets.underline.io/uploads/markdown_image/1/image/cea8a407085dee5422a2c16738ce27ca.png)](https://eipbn.org/abstracts/2021/)

To register for this event, please follow the link below.

Hydrogen Depassivation Lithography has been used to place donors with atomic precision in buried Si (100) planes to make quantum and atomic electronic devices. Recent demonstrations using acceptors to pair with donors enable bipolar junction transistors. These 2D-nanodevices should be extremely high-performance, low-noise, rad-hard, and capable of cryogenic operation.

Progress Toward 2D Nano Bipolar Junction Transistors

We demonstrate the co-deposition of B and P in aligned atomic-scale patterns, in order to make bipolar junction devices. This requires the use of BCl3 and PH3 as acceptor and donor dopant precursors, and dI/dV imaging to relocate the B electrode and align the P electrodes to it.

 Co-deposition of B and P for Ultraprecise Bipolar devices

Wafer-scale fabrication was used to create STEM-compatible operando graphene devices that can be characterized during operation. The e-beam can be used to further alter the device design. We employ use of secondary electron e-beam induced current (SEEBIC) imaging to visualize device conductivity and examine device failure modes in extreme conditions.

Toward atomic-scale e-beam fabrication: imaging and altering graphene-based devices

Nano fabrication technologies are subject of research in several fields. The development and commercialization of nano-inside products are still waiting for its break through. However, this paper will describe three examples of research workin fields of bioinspired computing, nano patterned surfaces for flexible substrates, and nano optics for spectroscopic measurement.

 How to implement “nano” in everyday life? Nano fabrication technologies in application oriented research and development

This work is about using near-field phase lithography and ALD process repeatedly to create non-uniform nanolattices with spatially varying geometry and material composition. The proposed approach is also employed to make an antireflection GRIN surface which successfully reduces the specular reflectance by more than 60%.

 Gradient-Index Nanolattices Using Multilayer Processing

We demonstrate for the first time that anisotropic hydrofluoric acid etch behavior beneath certain metal pads (Ti, Au, Pt, Cr) can be controlled to create ultra-sharp 3D silica pyramids due to an interface effect.

Fabrication of silica pyramids by enhanced lateral etching of hydrofluoric acid below metal films

Organic soft materials, such as gels are materials of choice for a vast number of biomedical applications such as tissue engineering, soft robotics, biosensing, drug delivery, implantable electronics, etc. Here we report on in-liquid direct write technique for 3D-sculpturing of hydrogels using focused electron and X-ray beams.

Electron and X-ray Beam Direct Write Lithography in Liquids: a Step Toward 3D Nanoprinting of Soft Materials

High aspect ratio nanostructuring requires high precision pattern transfer with highly directional etching. In this work, we demonstrate the fabrication of structures with unprecedented ultra-high aspect ratios up to 10’000:1 in the nanoscale regime (down to 10 nm) by metal assisted chemical etching (MacEtch) of silicon in gas phase.

Nanofabrication by Metal Assisted Chemical Etching of Silicon in Gas Phase

In this paper we report a series of breakthroughs that led to replication of gratings with a slant angle up to 60° and an aspect ratio of 10:1 in a material with refractive index of 1.90 (RI). A study of the replication process and materials optimization will be presented.

Nanoimprint process to mass manufacture highly-angled high-RI gratings for augmented reality combiners

Sequential vapor infiltration (SVI) with trimethylaluminum into UV-cured films visualized the presence of internal layered structures with different Al distributions dependent on chemical structure of monomers. X-ray reflectivity measurements revealed that the mixing of monomers was a positive way to homogenize the Al distributions in UV-cured films.

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