United States

This work presents the analysis of spike, burst, and network burst activity in a microfluidic brain-on-chip. A collection of activities in the electrophysiological recordings, measured by multielectrode arrays, provided strong clues for the maintenance of human induced pluripotent stem cells-derived cortical neuron cultures in 3D for 37 days.

EIPBN 2021

Detection of network burst activity in a MEMS-based 3D neuronal cell culture system

multielectrode array

microbioreactor

3d neuronal cell culture

**General Chair Welcome**

![](https://assets.underline.io/markdown_image/1/image/d6e6dddc08bf2371b9136ea9c18dc5ab.png)              

Welcome to ICALEO® 2023!
	
We were excited to host the world’s leading international conference on Lasers and Electro-Optics in Chicago. The Laser has been shown to have the potential to revolutionize solutions for major global challenges like energy usage and supply, global warming, and CO2 footprint. Even the fusion energy breakthrough is based on laser technology. The conference, with peer-reviewed scientific and technical presentations, focused on the newest results in Micro Applications, Macro Applications, Additive Manufacturing, Beam Shaping and Frontiers in Laser Applications. Additionally, the Battery-Manufacturing Track gave an overview of the process combined with the newest advances in laser application results. 

The Business Session brought the business aspect and environment of the laser to the audience and the possibility to discuss with seasoned industry leaders from around the world. 

Whether this is the first time you are hearing about ICALEO or you are a longtime attendee, you will find something of interest, new ideas, and an excellent opportunity to network with other laser specialists worldwide. 

**Klaus Löffler **  
ICALEO General Chair   
Managing Director, Precitec GmbH

**What is ICALEO?**

ICALEO® brings together the brightest minds, seasoned professionals, and pioneering researchers from around the world. With a laser-focused agenda, ICALEO offers an exceptional platform to delve into the cutting-edge advancements, diverse applications, and transformative research that define lasers and electro-optics.

Participants will be immersed in a dynamic environment that fosters collaborative learning, networking, and idea exchange. Through engaging plenary presentations, technical sessions, an industry business panel, and networking events, attendees gain insights into the forefront of laser technology. From industrial applications to medical breakthroughs, additive manufacturing to materials processing, ICALEO covers the entire spectrum of laser-related disciplines. Moreover, the event serves as a launching pad for synergistic partnerships, paving the way for professionals to forge connections that shape the future of our industry.

Join us in Chicago and be part of an unparalleled gathering that challenges the boundaries of possibility within lasers and electro-optics. As we convene to share knowledge, explore innovations, and cultivate collaborations, ICALEO stands as a pivotal force driving the evolution of this transformative technology.

**Who attended?**

ICALEO is tailor-made for professionals, researchers, academics, and enthusiasts who are deeply passionate about the world of lasers and electro-optics. If you're an industry trailblazer, an academic luminary, an aspiring expert, or a postgraduate student looking to dive into the latest developments and trends, this is an event you won't want to miss.

Industrial leaders seeking to stay ahead of the curve in their fields, engineers working on laser applications, and manufacturing experts interested in additive manufacturing and materials processing will find ICALEO to be an invaluable platform. Researchers and scientists exploring the forefront of laser technology, from fundamental principles to groundbreaking applications, will also discover a wealth of knowledge and networking opportunities.

Medical professionals investigating laser-based medical advancements, entrepreneurs seeking to innovate with lasers, educators aiming to stay updated with the latest in laser education, and policy makers shaping the industry's landscape are all essential attendees. Whether you're an established expert or a rising star, the 42nd annual ICALEO promises to offer a diverse ecosystem of expertise, connections, and knowledge sharing that caters to the laser and electro-optics communities.

**Fields Represented:**

* Entrepreneurs and Innovators
* Manufacturing Experts
* Students and Graduates
* Policy Makers and Regulators
* Consultants and Advisors
* Technology Enthusiasts
* Suppliers and Manufacturers
* Startups and Innovators
* Researchers in Laser Education

**[View All Proceedings Here](https://icaleo.conferencespot.org/event-data)**

### **Program Tracks & Chairs**

To access the site please register [**here**](https://icaleo.org/attend). 

Please register for the ICALEO 2023 Conference to join the event.

ICALEO 2023

ICALEO® brings together the brightest minds, seasoned professionals, and pioneering researchers from around the world. With a laser-focused agenda, ICALEO offers an exceptional platform to delve into the cutting-edge advancements, diverse applications, and transformative research that define lasers and electro-optics.

poster

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as "3-Beams," is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. In its 64th meeting, researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.
 
 
 
[![](https://assets.underline.io/uploads/markdown_image/1/image/4bdf4450aa93073cd684b096b403df2e.png)](https://drive.google.com/file/d/1CPaA3-Yf7_maBxJMUJaUORLF3HGO9CIe/view?usp=sharing) [![](https://assets.underline.io/uploads/markdown_image/1/image/cea8a407085dee5422a2c16738ce27ca.png)](https://eipbn.org/abstracts/2021/)

To register for this event, please follow the link below.

New resists are required to advance the nanoelectronics industry to keep up the demands of Moore’s law. A new class of high dry etch selectively electron beam resist materials have been developed that are based on a family of heterometallic rings.

Improving the Sensitivity of Metallic Organic Resists

Maskless Grayscale lithography is a key technology to create structured surfaces in photoresist, especially for micro-optic applications. Processes of low-contrast positive resist are well known and used for thicknesses up to 60 µm. The possibility to fabricate higher structures, i.e. 80 µm, 100 µm high and beyond, are of great interest in the micro-optic world. With some double- and triple-coated layers of an experimental resist, we could make structures 83µm and 100µm tall. The triple- coated layer showed some limitations that we plan to overcome to go beyond 100µm.

Improvements on Maskless Grayscale Lithography in thick positive photoresist

In this work, we present a systematic investigation of plasma etching of Cr2O3 films via an inductively coupled plasma-reactive ion etching system in nanoscale. The effects of plasma composition, rf-chuck power and ICP source power on the etch rates, sidewall profile, surface roughness, selectivity and dc-bias have been systematically investigated.

Patterning of Chromium Oxide (Cr2O3) as a Hard Mask by Plasma Etching

We characterize in-situ the impact of aberration-corrected electron-beam lithography (AC-EBL) on the performance of suspended graphene field-effect transistors. When AC-EBL is performed on the vicinity of a graphene channel, detrimental effects can be removed by vigorous annealing, while the damage caused by AC-EBL performed directly on a channel is irreversible.

In-situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography on the Electronic Transport of Suspended Graphene Devices

Massively-parallel electron-beam systems are developed to improve the writing throughput.  Two different methods to further decrease the writing time are investigated, i.e., reducing the maximum dose difference in a feature and utilizing empty cycles (with no beam on) in the conventional writing methods.

Reduction of Exposing Time in Massively-Parallel E-beam Systems

A modular, UHV sealed FEG operational betwee 30-100 keV has been developed. This design lends itself to integration onto thermionically operated TEMs, EBL into FEG operation or in R & D applications. Graphitic carbon and gold particles have been resolved confirming a resolution of better than 0.24nm at 60-100 keV.

A modular 100 keV vacuum sealed FEG

In this contribution, the generation of multiple electron-beam from an InGaN photocathode was demonstrated. 25 electron beams were observed by irradiating 25 lasers. The averaged diameter was 0.6 mm with a gaussian distribution. The deviation in diameter was 17%.

Multiple Electron-Beam Generation from InGaN Photocathode

For direct writing laser lithography, GenISys BEAMER and LAB software allows for correcting proximity effects and to achieve fast approximation of a desired shape without tedious iterations. We show the importance of parameters such as vertical focus variation on staircase structures and lens-like shapes using a Heidelberg Instruments DWL 66+.

Bend the curve: the benefit of optical proximity correction in direct writing lithography simulation and experiment

After irradiating the electron beam, we measured the surface potential with an electrostatic force microscope (EFM).
In the presentation, we will explain the measurement results using the model we devised.

Investigation of Non-Charging Exposure Conditions for Insulating Resist Films in Electron Beam Lithography

We investigate the surface wetting properties for a range of micro/nanofabricated topography on aluminium surfaces supported by ion-beam processing to enhance liquid-solid interaction.

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