United States

Massively-parallel electron-beam systems are developed to improve the writing throughput.  Two different methods to further decrease the writing time are investigated, i.e., reducing the maximum dose difference in a feature and utilizing empty cycles (with no beam on) in the conventional writing methods.

EIPBN 2021

Reduction of Exposing Time in Massively-Parallel E-beam Systems

 **RTSS 2021** has successfully concluded. Hope you have enjoyed it, and look forward to seeing you next year in person.
    Announcement for the Awards:
 * Best Paper Award goes to: Monte Carlo Response-Time Analysis, Sergey Bozhko, Georg von der Brüggen, and Björn Brandenburg
 * Best Student Paper Award goes to: Automatic Energy-Hotspot Detection and Elimination in Real-Time Deeply Embedded Systems, Mohsen Shekarisaz, Lothar Thiele, and Mehdi Kargahi.
 * Best Solution Award for Industry Session goes to: Toward Real-Time Guaranteed Scheduling for Autonomous Driving Systems. Jinghao Sun, Tianyi Wang, Kailu Duan, Bin Lu, Jiankang Ren, Zhishan Guo, and Guozhen Tan.



IEEE RTSS 2021

The IEEE Real-Time Systems Symposium (RTSS) is the premier conference in the field of real-time systems, and is a venue for researchers and practitioners to showcase innovations covering all aspects of real-time systems, including theory, design, analysis, implementation, evaluation, and experience. 

poster

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as "3-Beams," is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. In its 64th meeting, researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.
 
 
 
[![](https://assets.underline.io/uploads/markdown_image/1/image/4bdf4450aa93073cd684b096b403df2e.png)](https://drive.google.com/file/d/1CPaA3-Yf7_maBxJMUJaUORLF3HGO9CIe/view?usp=sharing) [![](https://assets.underline.io/uploads/markdown_image/1/image/cea8a407085dee5422a2c16738ce27ca.png)](https://eipbn.org/abstracts/2021/)

To register for this event, please follow the link below.

Applications of electrospinning (ES) fabrication are broad and limited by hardware. Here, we present an ES system that contains multiple high voltage power supplies and enables high control over nanofiber placement, resulting in deposition of materials that have novel structures on the mesoscale.

Highly Controlled Deposition with Multiple Electrode Electrospinning

Our goal is to demonstrate a process flow for TSV (nozzle) on one end and another opening (reservoir) on the other end of an SOI. This silicon die will be used as a micro chemical vapor deposition (CVD) chamber, which is a critical component in the nanoscale additive writing process.

Fabrication of Micro Chemical Vapor Deposition Chamber by Dry dry Deep Silicon and Metal-Assisted Etching Techniques

We developed a versatile room-temperature metal printing technique based on polymer-assisted photochemical deposition (PPD). We demonstrate printing of metal structures with feature sizes as small as 5µm on various substrates, and prove the concept of creating metal-based color filter using PPD.

Additive Manufacturing towards Color Printing via Polymer-Assisted Photochemical Deposition of Metal Thin Films

The heavy metals are poisonous due to inability to decompose and bioaccumulation hence, among the cost well-known environmental pollutant.  Fluorescent based approach has gained considerable attention because of real time monitoring. Aiming at developing an ideal fluorescent sensing platform for heavy metals we synthesized bimetallic MOF for the first time.

Fabrication of luminescent metal-organic framework for optical detection of heavy metals

Here we demonstrate a new type of magnetically responsive nanostructure consisting of a polydimethylsiloxane (PDMS) nanopillar array with deposited nickel caps, that has successfully achieved such decoupling with multiple cap-geometry designs for a better actuation control.

Magnetically Responsive Polymer Nanopillars with Nickel Cap

we have proposed a hybrid machine learning system that presents the optimum materials and process conditions for direct nanoimprint.　The system applied for optimization of Glycol concentration to PVA for low temperature process and the results agree with experiments.

Process and material design using hybrid machine learning for direct thermal nanoimprint

New resists are required to advance the nanoelectronics industry to keep up the demands of Moore’s law. A new class of high dry etch selectively electron beam resist materials have been developed that are based on a family of heterometallic rings.

Improving the Sensitivity of Metallic Organic Resists

Maskless Grayscale lithography is a key technology to create structured surfaces in photoresist, especially for micro-optic applications. Processes of low-contrast positive resist are well known and used for thicknesses up to 60 µm. The possibility to fabricate higher structures, i.e. 80 µm, 100 µm high and beyond, are of great interest in the micro-optic world. With some double- and triple-coated layers of an experimental resist, we could make structures 83µm and 100µm tall. The triple- coated layer showed some limitations that we plan to overcome to go beyond 100µm.

Improvements on Maskless Grayscale Lithography in thick positive photoresist

In this work, we present a systematic investigation of plasma etching of Cr2O3 films via an inductively coupled plasma-reactive ion etching system in nanoscale. The effects of plasma composition, rf-chuck power and ICP source power on the etch rates, sidewall profile, surface roughness, selectivity and dc-bias have been systematically investigated.

Patterning of Chromium Oxide (Cr2O3) as a Hard Mask by Plasma Etching

We characterize in-situ the impact of aberration-corrected electron-beam lithography (AC-EBL) on the performance of suspended graphene field-effect transistors. When AC-EBL is performed on the vicinity of a graphene channel, detrimental effects can be removed by vigorous annealing, while the damage caused by AC-EBL performed directly on a channel is irreversible.

Premium content

Reduction of Exposing Time in Massively-Parallel E-beam Systems

Downloads

Next from EIPBN 2021

Highly Controlled Deposition with Multiple Electrode Electrospinning

Similar lecture

Extending EDF for Soft Real-Time Scheduling on Unrelated Multiprocessors

Stay up to date with the latest Underline news!

PRESENTATIONS

CONFERENCES

COMPANY

RESOURCES