Wafer-scale fabrication was used to create STEM-compatible operando graphene devices that can be characterized during operation. The e-beam can be used to further alter the device design. We employ use of secondary electron e-beam induced current (SEEBIC) imaging to visualize device conductivity and examine device failure modes in extreme conditions.

Toward atomic-scale e-beam fabrication: imaging and altering graphene-based devices

Oak Ridge National Laboratory

machine learning

Stephen Jesse

1

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