In direct writing laser lithography, hybrid structures such as gratings on top of resist structures can be generated by combining thermal NIL with DWL lithography. At 120 °C, it is still possible to pattern the resist into at least 4 µm depth without degrading the photosensitive component.

Hybrid structures achieved by direct writing laser lithography - tuning the contrast and surface topography of grayscale photoresist with nanoimprint lithography

For direct writing laser lithography, GenISys BEAMER and LAB software allows for correcting proximity effects and to achieve fast approximation of a desired shape without tedious iterations. We show the importance of parameters such as vertical focus variation on staircase structures and lens-like shapes using a Heidelberg Instruments DWL 66+.

Bend the curve: the benefit of optical proximity correction in direct writing lithography simulation and experiment

**Session Chairs:**
 Laurent Pain and Qiangfei Xia

Sessions 2C Q&A - Nanoimprint

technical paper

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as "3-Beams," is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. In its 64th meeting, researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.
 
 
 
[![](https://assets.underline.io/uploads/markdown_image/1/image/4bdf4450aa93073cd684b096b403df2e.png)](https://drive.google.com/file/d/1CPaA3-Yf7_maBxJMUJaUORLF3HGO9CIe/view?usp=sharing) [![](https://assets.underline.io/uploads/markdown_image/1/image/cea8a407085dee5422a2c16738ce27ca.png)](https://eipbn.org/abstracts/2021/)

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EIPBN 2021

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Jan Nico Erjawetz

2

SHORT BIO

Presentations

Hybrid structures achieved by direct writing laser lithography - tuning the contrast and surface topography of grayscale photoresist with nanoimprint lithography

Bend the curve: the benefit of optical proximity correction in direct writing lithography simulation and experiment

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