Dr. Andrei Kolmakov is a Project Leader in the Nanoscale Imaging Group/ Nanoscale Device Characterization Division at NIST. He received an M.S. in Physics from the Moscow Institute of Physics and Technology, Russia, and a Ph.D. in Physics from the National Research Center, Kurchatov Institute, Russia. Following his postdoctoral work at the ELETTRA and HASYLAB synchrotrons, he joined the research staff at Texas A&M University and conducted original in situ STM studies on individual supported metal clusters under reaction conditions. Expanding nanotechnology applications of low dimensional materials at the Department of Chemistry and Biochemistry at UC-Santa Barbara, he performed seminal research in the field of gas sensorics with metal oxide nanowires. Before joining NIST, Prof. Kolmakov was a faculty member in the Department of Physics at Southern Illinois University, Carbondale, where his team developed new fabrication protocols, device architectures, and operation principles for chemical sensing with low dimensional metal oxides. His group also employed modern synchrotron radiation-based spectro-microscopy techniques such as Scanning Photoelectron Spectro-Microscopy (SPEM), Photoemission Electron Microscopy (PEEM), and X-ray microdiffraction as well as scanning probe and electron microscopy for in situ and in operando characterization of individual nanodevices. Andrei has pioneered the application of ultrathin 2D materials as electron transparent membranes for (photo-)electron (XPS, PEEM, AES, XAS, SEM) spectro-microscopies in liquids and dense gases. He has published over 150 research papers with over 10000 citations, several review articles, and book chapters, co-authored four patents, and has co-edited a book on nanostructured metal oxide sensing systems. Andrei’s current research interests are in the development of the methodology and instrumentation for in situ / in operando electron (and X-ray) imaging, spectroscopic characterization of nanodevices, and active interfaces under realistic environments, including liquid, dense gaseous, and plasma media.