Sijia Xie
Paul Scherrer Institute, Würenlingen, Switzerland
grayscale lithography
greyscale lithography
microlenses
proximity effect
hybrid structuring
nanoimprint
direct write lithography
2
presentations
SHORT BIO
Sijia Xie is postdoc in the Polymer Nanotechnology Group (INKA-PSI) in the Laboratory for Micro- and Nanotechnology (LMN) at the Paul Scherrer Institute, Switzerland. She obtained BSc. in fundamental science and MSc. in chemistry at Tsinghua University, Beijing, China, and received her PhD at the University of Twente, Enschede, the Netherlands, on brain-on-a-chip integrated neuronal networks. Since 2018, she is working on patterning on non-flat surfaces using replication techniques at PSI.
Presentations
Hybrid structures achieved by direct writing laser lithography - tuning the contrast and surface topography of grayscale photoresist with nanoimprint lithography
Jan Nico Erjawetz and 3 other authors
Bend the curve: the benefit of optical proximity correction in direct writing lithography simulation and experiment
Jan Nico Erjawetz and 6 other authors