We study oxygen flow role during IGZO PVD process on high temperature PBTI in back-gated TFTs by combining light-assisted with electrical stress measurements. Oxygen flow is observed to affect the magnitude of charge trapping and hydrogen related channel doping during PBTI. We show a correlation between sub-gap DOS and oxygen flow during deposition: the larger the oxygen flow, the smaller the light response at time-zero and its increase during PBTI, despite a larger negative DVth. 

Light-assisted investigation of the role of oxygen flow during IGZO deposition on deep subgap states and their evolution under PBTI

NBTI of IGZO TFTs is studied using diverse devices and conditions. Four main characteristics are observed: V th shift is almost independent of V g_stress, and shows a large activation energy and a steep time kinetic, while the relaxation rate decreases with increasing temperatures. Using TCAD and modelling, these peculiar features can be explained by an oxide-field-dominated hydrogen release at gate side of the gate-dielectric, inducing additional doping and the negative V th shift.

Fundamental understanding of NBTI degradation mechanism in IGZO channel devices

5A (Process Integration)

technical paper

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The IEEE International Reliability Physics Symposium (IRPS) is the premiere conference for engineers and scientists to present new and original work in the area of microelectronics reliability. IRPS seeks to understand the reliability of semiconductor devices, integrated circuits, and microelectronic assemblies through an improved understanding of both the physics of failure as well as the application environment. 

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Light-assisted investigation of the role of oxygen flow during IGZO deposition on deep subgap states and their evolution under PBTI

Fundamental understanding of NBTI degradation mechanism in IGZO channel devices

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