
Raik Hoffmann
Fraunhofer IPMS - Center Nanoelectronic Technologies CNT, Germany
cryogenic
defects
charge trapping
fefets
flicker noise
3
presentations
1
citations
Presentations

Improved endurance reliability of ferroelectric hafnium oxide-based BEoL integrated MFM capacitors
Ayse Sünbül and 9 other authors

Impact of Temperature on Reliability of MFIS HZO-based Ferroelectric Tunnel Junctions
Ayse Sünbül and 14 other authors

Reliability of Ferroelectric and Antiferroelectric Si:HfO2 materials in 3D capacitors by TDDB studies
Alison Erlene Viegas and 7 other authors