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Raik Hoffmann

Fraunhofer IPMS - Center Nanoelectronic Technologies CNT, Germany

cryogenic

defects

charge trapping

fefets

flicker noise

3

presentations

1

citations

Presentations

Improved endurance reliability of ferroelectric hafnium oxide-based BEoL integrated MFM capacitors

Ayse Sünbül and 9 other authors

Impact of Temperature on Reliability of MFIS HZO-based Ferroelectric Tunnel Junctions

Ayse Sünbül and 14 other authors

Reliability of Ferroelectric and Antiferroelectric Si:HfO2 materials in 3D capacitors by TDDB studies

Alison Erlene Viegas and 7 other authors

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