Ernest Y. Wu
IBM Research, United States
tddb
variability
beol
schottky-emission
clustering-function formulation of temporal and spatial clustering model for dielectric breakdown
general statistical model for dielectric breakdown including reverse area scaling – the role of area-dependent dynamic competition
gaa
degradation
ns
7
presentations
6
number of views
SHORT BIO
Ernest Y. Wu (M'90) received M.S. and Ph.D. degrees in physics from the University of Kansas, Lawrence, in 1986 and 1989, respectively.,In 1994, he joined the IBM Microelectronics Division, Essex Junction, VT, where he is currently a Senior Technical Staff Member with the Technology Reliability Department, Semiconductor Research and Development Center (SRDC), IBM System and Technology Group. He is responsible for technology qualification and development of dielectric reliability methodologies. He authored and coauthored more than 100 technical and conference papers with several invited papers and tutorials, as well as 11 IEEE International Electron Device Meeting (IEDM) papers. His research interests include reliability physics, device physics, and carrier transport phenomena.,Dr. Wu has served on the Device Dielectric Committee as the Chair and a Cochair for the 2007 and the 2005 International Reliability Physics Symposium (IRPS), respectively. He is a member of the CMOS and Interconnect Reliability committee of IEDM for 1999 and 2000.
Presentations
9A.2 -General statistical model for dielectric breakdown including reverse area scaling – The role of area-dependent dynamic competition
Ernest Y. Wu and 2 other authors
2A.2 - A new clustering-function-based formulation of temporal and spatial clustering model involving area scaling and its application to parameter extraction
Ernest Y. Wu and 5 other authors
2A.1 (Invited) - Challenges of gate stack TDDB in gate-all-around nanosheet towards further scaling
Huimei Zhou and 2 other authors
Quantum Mechanical Connection of Schottky Emission Mechanism and Its implications on Breakdown Methodology and Conduction Modeling for BEOL Low-k Dielectrics
Ernest Y. Wu and 1 other author
A Flexible and Inherently Self-Consistent Methodology for MOL/BEOL/MIMCAP TDDB Applications with Excessive Variability-Induced Degradation
Ernest Y. Wu