Lecture image placeholder

Premium content

Access to this content requires a subscription. You must be a premium user to view this content.

Monthly subscription - $9.99Pay per view - $4.99Access through your institutionLogin with Underline account
Need help?
Contact us
Lecture placeholder background
VIDEO DOI: https://doi.org/10.48448/ppxc-zs91

technical paper

MMM 2022

November 07, 2022

Minneapolis, United States

Reactive Molecular Dynamics Modeling of Plasma Etching of L10 FePt Magnetic Media

Patterned FePt media solutions, such as Bit-Patterned Media (BPM) and Embedded Hardmask Patterning (EMP), have been proposed as alternative methods to improve Heat-Assisted Magnetic Recording areal density. Understanding etching mechanism of FePt material is important to warrent the low damage to the magnetic properties caused by micro-fabrication process. In this research, Reactive Molecular Dynamics (MD) modeling is carried out to study methanol (MeOH) plasma etch on L10-FePt media. The atomistic-level etch simulation process is divided into two sequential MD simulation steps: the radical-based reactive treatment step, followed by the ion-based physical etch step. Carbon-monoxide (CO) and H2 molecules are identified as the main etch precursors in methanol plasma interacting with substrate. Reactive interaction between CO/H2 radicals and Fe/Pt atoms is studied using bond-order ReaxFF force field with atomic charge calculation. Bond energy calculation shows the positively charged Fe and Pt and the negatively charged C atoms in CO molecules can form ionic carbonyl bonds that are shown more stable than Fe-Pt metallic bonds. As the result, it is found that the number of Fe(CO) and Pt(CO) carbonyl bonds are dominated among the new bonds produced after the reactive-treatment process. In the following physical etch step simulated with Ar or He ion bombardment, in comparison with FePt surface without CO/H2 treatment, the sputter yield of FePt can significantly improve by 2-4X on the samples with the CO/H2-treatment step.
1 H. Wang, H. Zhao, P. Quarterman, and J.-P. Wang, Appl. Phys. Lett., vol. 102, no. 5, p. 052406, 2013
2 Patent: US10,347,467B2, J.-P. Wang, P. Quarterman and J. Zhu
3 LAMMPS - A flexible simulation tool for particle-based materials modeling at the atomic, meso, and continuum scales, Comp. Phys. Comm. (accepted 09/2021), DOI:10.1016/j.cpc.2021.108171
4 J. Zhu, P. Quarterman, J.-P. Wang, AIP Advances 2017, 7 (5) , 056507. https://doi.org/10.1063/1.4977223

Figure 1. Number and types of carbonyl bonds created on FePt surface after CO/H2 exposure

Figure 2. FePt sputter yield ( with Ar ions) comparison on CO/H2-treated and non-treated surface


Transcript English (automatic)

Next from MMM 2022

On Off Ferromagnetism in Co3O4 by Voltage
technical paper

On Off Ferromagnetism in Co3O4 by Voltage

MMM 2022

Enric Menendez and 6 other authors

07 November 2022

Stay up to date with the latest Underline news!

Select topic of interest (you can select more than one)


  • All Lectures
  • For Librarians
  • Resource Center
  • Free Trial
Underline Science, Inc.
1216 Broadway, 2nd Floor, New York, NY 10001, USA

© 2023 Underline - All rights reserved