This work is about using near-field phase lithography and ALD process repeatedly to create non-uniform nanolattices with spatially varying geometry and material composition. The proposed approach is also employed to make an antireflection GRIN surface which successfully reduces the specular reflectance by more than 60%.

 Gradient-Index Nanolattices Using Multilayer Processing

Virtual metrology refers to methods that employ manufacturing process related data and relevant sensor readings to predict properties of the product. The initial results examining the end-point detection of a single RIE step indicate that the approach is viable and performs better compared with traditional feature identification by user experience.

VM Modeling of Reactive Ion Etching Based on Statistics-Based and Dynamics-Inspired Spectral Features

In this work, we apply multilayer etching mask and optimize the etch process to improve etching rate and etching selectivity to pattern sapphire antireflection nanostructures. Initial results show 2-D sapphire nanostructures with 530 nm width and 470 nm height, resulting in two-fold aspect ratio enhancement over previous work.

Plasma Etching of High Aspect ratio Sapphire Antireflection Nanostructures Using Multilayer Etching Mask

In this work, a geometric model was developed using line-by-line assembly of non-monodispersed binary nanoparticles to obtain a randomly closed packed assembly structure. To validate the results from the script, a binary nanoparticle assembly was experimentally fabricated. The experimental and simulated FFT peak frequencies were compare.

Modeling Co-Assembly of Binary Non-Monodispersed Nanospheres

**Session Chairs:**
 Rebecca Cheung and Andrei Kolmakov

Sessions 2B Q&A - 3D Nanosculpturing

technical paper

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as "3-Beams," is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. In its 64th meeting, researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.
 
 
 
[![](https://assets.underline.io/uploads/markdown_image/1/image/4bdf4450aa93073cd684b096b403df2e.png)](https://drive.google.com/file/d/1CPaA3-Yf7_maBxJMUJaUORLF3HGO9CIe/view?usp=sharing) [![](https://assets.underline.io/uploads/markdown_image/1/image/cea8a407085dee5422a2c16738ce27ca.png)](https://eipbn.org/abstracts/2021/)

To register for this event, please follow the link below.

EIPBN 2021

**Session Chairs:**
 Mark Schattenburg and Dario Goldfarb

Sessions 4B Q&A - Materials and Pattern Transfer Techniques

**Click 'See All' on the righthand side of the page to expand the view and see all of the posters. **



Chih-Hao Chang

7

Presentations

Gradient-Index Nanolattices Using Multilayer Processing

VM Modeling of Reactive Ion Etching Based on Statistics-Based and Dynamics-Inspired Spectral Features

Plasma Etching of High Aspect ratio Sapphire Antireflection Nanostructures Using Multilayer Etching Mask

Modeling Co-Assembly of Binary Non-Monodispersed Nanospheres

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